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Effect of Deposition Temperature on the Characteristics of HfNx Thin Films Prepared by Plasma Assisted Cyclic Chemical Vapor Deposition
Kim, Eun-Jeong, Woo, Hee-Gweon, Kim, Do-HeyoungVolume:
10
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2010.2345
Date:
May, 2010
File:
PDF, 281 KB
english, 2010