Suppression of Electrical Breakdown in Silicon Nitride...

Suppression of Electrical Breakdown in Silicon Nitride Films Deposited by Catalytic Chemical Vapor Deposition at Temperatures Below 200 °C

Lee, Kyoung-Min, Hong, Wan-Shick
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
11
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2011.3195
Date:
January, 2011
File:
PDF, 578 KB
english, 2011
Conversion to is in progress
Conversion to is failed