Band offset and interface chemistry of HfO2/Si (001)...

Band offset and interface chemistry of HfO2/Si (001) prepared by electron-beam evaporation in ultrahigh vacuum using atomic oxygen

Xu Run, Tang Minyan, Yan Zhijun, Wang Linjun, Xia Yiben, Xu Fei
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Volume:
248
Year:
2011
Language:
english
Pages:
4
DOI:
10.1002/pssb.201046194
File:
PDF, 278 KB
english, 2011
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