SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Process optimization for 0.35-um i-line lithography
Garza, Sr., Cesar M., Krisa, William L., Yen, Anthony, Shu, Jing S., Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175458
File:
PDF, 824 KB
english, 1994