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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Measuring the effects of sub-0.1-μm filtration on 248-nm photoresist performance
Gotlinsky, Barry, Beach, James V., Mesawich, Michael, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388292
File:
PDF, 3.90 MB
english, 2000