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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Novel laser ablation patterning with organic film in running water
Ito, Shinichi, Ikegami, Hiroshi, Kawano, Kenji, Takeishi, Tomoyuki, Hayasaka, Nobuo, Kobayashi, Masayoshi, Hamamoto, Tetsuya, Ogawa, Yoichi, Yoshitaka, Naoto, Terada, Shoichi, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485045
File:
PDF, 640 KB
english, 2003