SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - The transfer of photoresist LER through etch
Pawloski, Adam R., Lin, Qinghuang, Acheta, Alden, Bell, Scott, La Fontaine, Bruno, Wallow, Tom, Levinson, Harry J.Volume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.652206
File:
PDF, 2.87 MB
english, 2006