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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer
Wallow, Thomas, Lin, Qinghuang, Acheta, Alden, Ma, Yuansheng, Pawloski, Adam, Bell, Scott, Ward, Brandon, Tabery, Cyrus, La Fontaine, Bruno, Kim, Ryoung-han, McGowan, Sarah, Levinson, Harry J.Volume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712319
File:
PDF, 1.08 MB
english, 2007