Characterization of Low-k Dielectric SiCOH Films Deposited...

Journal of Nanoscience and Nanotechnology 2012 / 07 Vol. 12; Iss. 7

Characterization of Low-k Dielectric SiCOH Films Deposited with Decamethylcyclopentasiloxane and Cyclohexane

Kim, Daekyoung, Kim, Hoonbae, Jang, Haegyu, Jung, Donggeun, Chae, Heeyeop
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Volume:
12
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2012.6270
Date:
July, 2012
File:
PDF, 729 KB
english, 2012
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