High Density of Line Pattern by Using De-Wetting During...

Journal of Nanoscience and Nanotechnology 2015 / 02 Vol. 15; Iss. 2

High Density of Line Pattern by Using De-Wetting During Soft-Lithography

Lee, Jisun, Lee, Su Kyoung, Jung, Jin-Mi, Jung, Hee-Tae
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Volume:
15
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2015.9291
Date:
February, 2015
File:
PDF, 447 KB
english, 2015
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