[IEEE 2016 China Semiconductor Technology International...

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[IEEE 2016 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2016.3.13-2016.3.14)] 2016 China Semiconductor Technology International Conference (CSTIC) - Elimination of Tungsten-voids in middle-of-line contacts for advanced planar CMOS AND FinFET technology

Peng, Wen Pin, Chi, Min-hwa, Derderian, Garo, Das, Kakoli, Zhang, Yang, Laloe, Jean-Baptiste, Deniz, Derya, Patil, Suraj, Yan, Jianghu, Singh, SherJang, Zhang, Xiaodong, Zhu, Lei
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Year:
2016
Language:
english
DOI:
10.1109/CSTIC.2016.7464004
File:
PDF, 779 KB
english, 2016
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