[IEEE 2016 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2016.3.13-2016.3.14)] 2016 China Semiconductor Technology International Conference (CSTIC) - Optimization of 28nm HK/MG single wafer cleaning process
Liang, Haihui, Liu, JiaLei, Liu, HuanXin, He, Yonggen, Wu, Jingang, Ge, Xiaojing, Haigermoser, ChristianYear:
2016
Language:
english
DOI:
10.1109/cstic.2016.7464007
File:
PDF, 622 KB
english, 2016