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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - A new mask linearity specification for EUV masks based on time dependent dielectric breakdown requirements
Standiford, Keith, Bürgel, Christian, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2023109
File:
PDF, 413 KB
english, 2013