SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Two-dimensional mask effects at the 14 nm logic node
Zweber, A. E., McGuire, A., Hibbs, M., Nash, S., Ballman, K., Faure, T., Rankin, J., Isogawa, T., Senna, T., Negishi, Y., Miller, M., Barai, S., Dechene, D. J., Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2028909
File:
PDF, 1.03 MB
english, 2013
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