![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP
Ackmann, Paul W., Hayashi, Naoya, Pack, Robert C., Standiford, Keith, Lukanc, Todd, Ning, Guo Xiang, Verma, Piyush, Batarseh, Fadi, Chua, Gek Soon, Fujimura, Akira, Pang, LinyongVolume:
9235
Year:
2014
Language:
english
DOI:
10.1117/12.2069613
File:
PDF, 3.11 MB
english, 2014