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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Requirements of the e-beam shot quality for mask patterning of the sub-1X device
Bencher, Christopher, Cheng, Joy Y., Park, Sinjeung, Park, Jongmun, Lee, Boram, Choi, Jin, Shin, In Kyun, Jeon, Chan-UkVolume:
9777
Year:
2016
Language:
english
DOI:
10.1117/12.2218340
File:
PDF, 522 KB
english, 2016