SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - High-radiance LDP source: clean, reliable, and stable EUV source for mask inspection
Panning, Eric M., Goldberg, Kenneth A., Teramoto, Yusuke, Santos, Bárbara, Mertens, Guido, Kops, Ralf, Kops, Margarete, von Wezyk, Alexander, Bergmann, Klaus, Yabuta, Hironobu, Nagano, Akihisa, AshizaVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2219219
File:
PDF, 842 KB
english, 2016