SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Limits to etch resistance for 193-nm single-layer resists
Kunz, Roderick R., Palmateer, Susan C., Forte, Anthony R., Allen, Robert D., Wallraff, Gregory M., Di Pietro, Richard A., Hofer, Donald C., Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241835
File:
PDF, 773 KB
english, 1996