SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Latitude of the BAR process compared to the monolayer and TAR processes for 0.35-μm design rules at gate level
Andre, Sandrine, Weill, Andre P., Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241868
File:
PDF, 446 KB
english, 1996