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SPIE Proceedings [SPIE Microelectronic Manufacturing 1996 - Austin, TX (Wednesday 16 October 1996)] Microelectronic Device and Multilevel Interconnection Technology II - Materials and processing issues in the development of N2O/NO-based ultrathin oxynitride gate dielectrics for CMOS ULSI applications
Kim, Byeong Y., Wristers, Dirk, Kwong, Dim-Lee, Chen, Ih-Chin, Sasaki, Nobuo, Patel, Divyesh N., Dixit, Girish A.Volume:
2875
Year:
1996
Language:
english
DOI:
10.1117/12.250864
File:
PDF, 783 KB
english, 1996