SPIE Proceedings [SPIE Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V - Kawasaki City, Japan (Thursday 9 April 1998)] Photomask and X-Ray Mask Technology V - Application of dry etching to 1-Gb DRAM mask fabrication
Inoue, Takashi, Matsuda, Yoshiki, Tanaka, Yoshiyuki, Aizaki, NaoakiVolume:
3412
Year:
1998
Language:
english
DOI:
10.1117/12.328863
File:
PDF, 2.29 MB
english, 1998