SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering-bar optical proximity correction
Adam, Konstantinos, Socha, Robert J., Dusa, Mircea V., Neureuther, Andrew R., Grenon, Brian J., Abboud, Frank E.Volume:
3546
Year:
1998
Language:
english
DOI:
10.1117/12.332862
File:
PDF, 446 KB
english, 1998