SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Photoresist removal using gaseous sulfur trioxide cleaning technology
Del Puppo, Helene, Bocian, Paul B., Waleh, Ahmad, Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350793
File:
PDF, 2.28 MB
english, 1999