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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Novel metrology for measuring spectral purity of KrF lasers for deep-UV lithography
Ershov, Alexander I., Padmabandu, Gunasiri G., Tyler, Jeremy D., Das, Palash P., Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350848
File:
PDF, 848 KB
english, 1999