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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Development of a 0.1 μm linewidth fabrication process for x-ray lithography with a laser plasma source
Bobkowski, Romuald, Fedosejevs, Robert, Broughton, James N., Vladimirsky, YuliVolume:
3676
Year:
1999
Language:
english
DOI:
10.1117/12.351111
File:
PDF, 3.50 MB
english, 1999