SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Structurally variable cyclopolymers with excellent etch resistance and their application to 193-nm lithography
Klopp, John M., Pasini, Dario, Frechet, Jean M. J., Byers, Jeff D., Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388314
File:
PDF, 956 KB
english, 2000