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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Magnetron sputtered EUV mirrors with high-thermal stability
Feigl, Torsten, Yulin, Sergey A., Kaiser, Norbert, Thielsch, Roland, Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390079
File:
PDF, 1.41 MB
english, 2000