SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Thermomechanical modeling of the SCALPEL mask during exposure
Martin, Carl J., Engelstad, Roxann L., Lovell, Edward G., Liddle, James A., Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390094
File:
PDF, 4.12 MB
english, 2000