![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Defect dispositioning using mask printability on attenuated phase-shift production photomasks
Novak, Justin W., Eynon, Jr., Benjamin G., Poortinga, Eric, Rosenbusch, Anja, Eran, Yair, Grenon, Brian J., Dao, Giang T.Volume:
4186
Year:
2001
Language:
english
DOI:
10.1117/12.410771
File:
PDF, 150 KB
english, 2001