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SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - Automatic resist parameter calibration procedure for lithography simulation
Tollkuehn, Bernd, Hoepfl, Max J., Erdmann, Andreas, Majoni, Stefan, Jess, Marion, Mack, Chris A., Stevenson, TomVolume:
4404
Year:
2001
Language:
english
DOI:
10.1117/12.425221
File:
PDF, 360 KB
english, 2001