SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Development of data conversion system for electron-beam projection lithography (EPL) mask
Yamada, Yasuhisa, Kobinata, Hideo, Tamura, Takao, Miyasaka, Mami, Sakamoto, Tatsuya, Ogawa, Yuzo, Takada, Kenichi, Yamashita, Hiroshi, Nozue, Hiroshi, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436678
File:
PDF, 563 KB
english, 2001