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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Study on PSM defect printability of extremely low-k1 sub-130 nm KrF lithography
Cho, Won-Il, Yeo, Gisung, Moon, Seong-Yong, Yoon, Hee-Sun, Sohn, Jung-Min, Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.468095
File:
PDF, 853 KB
english, 2002