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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Design considerations for bottom antireflective coating for 157 nm lithography
Claypool, James B., Puligadda, Rama, Akers, Jill, Sakamoto, Rikimaru, Mizusawa, Kenichi, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474182
File:
PDF, 563 KB
english, 2002