SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Maximizing common process latitude by integrated process development for 130-nm lithography
Reilly, Michael T., Parker, Colin R., Fischer, Frank W., Hiar, Todd, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474626
File:
PDF, 344 KB
english, 2002