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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Metrology methods comparison for 2D structures on binary and embedded attenuated phase-shift masks
Lassiter, Matthew, Eynon, Jr., Benjamin G., Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476969
File:
PDF, 132 KB
english, 2002