SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara,...

  • Main
  • SPIE Proceedings [SPIE Microlithography...

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers

Ito, Hiroshi, Hinsberg, William D., Rhodes, Larry F., Chang, Chun, Fedynyshyn, Theodore H.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485135
File:
PDF, 371 KB
english, 2003
Conversion to is in progress
Conversion to is failed