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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers
Ito, Hiroshi, Hinsberg, William D., Rhodes, Larry F., Chang, Chun, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485135
File:
PDF, 371 KB
english, 2003