SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Organosiloxane-based bottom antireflective coatings for 193-nm lithography
Kennedy, Joseph T., Baldwin-Hendricks, Teresa, Stuck, Jason, Suedmeyer, Arlene, Thanawala, Shilpa, Do, Kim, Iwamoto, Nancy E., Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485158
File:
PDF, 238 KB
english, 2003