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SPIE Proceedings [SPIE Santa Cl - DL tentative - Santa Clara, CA (Saturday 15 September 1990)] Advanced Techniques for Integrated Circuit Processing - Focused ion-beam vacuum lithography of InP with an ultrathin native oxide resist
Wang, Yuh-Lin, Temkin, Henryk, Harriott, Lloyd R., Hamm, Robert A., Bondur, James A., Turner, Terry R.Volume:
1392
Year:
1991
Language:
english
DOI:
10.1117/12.48952
File:
PDF, 381 KB
english, 1991