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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Improvement of critical dimension stability of chemically amplified resist by overcoat II
Kumada, Teruhiko, Tanabe, Hiroyoshi, Tange, Koji, Maetoko, Kazuyuki, Hosono, Kunihiro, Tsuzuki, Masayoshi, Yonetani, Kyoichi, Terada, Reiji, Nakashiba, Yukio, Anzai, Shingo, Kikuchi, YasutakaVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504182
File:
PDF, 73 KB
english, 2003