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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Why do weak acids not work in 193-nm photoresists?: matrix effects on acid-catalyzed deprotection
Pohlers, Gerd, Barclay, George G., Razvi, Azher, Stafford, Carolyne, Barbieri, Anthony, Cameron, James F., Sturtevant, John L.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.537186
File:
PDF, 1.21 MB
english, 2004