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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - EUV imaging with a 13nm tabletop laser reaches sub-38nm spatial resolution
Vaschenko, Georgiy, Lercel, Michael J., Brizuela, Fernando, Brewer, Courtney, Larotonda, Miguel A., Wang, Yong, Luther, Bradley M., Marconi, Mario C., Rocca, Jorge J., Menoni, Carmen S., Chao, Weilun,Volume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.656588
File:
PDF, 664 KB
english, 2006