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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Data Analysis and Modeling for Process Control III - Improvement of OPC accuracy for 65nm node contact using KIF
Wu, Te Hung, Emami, Iraj, Tobin, Jr., Kenneth W., Lin, C. L., Chen, Ming Jui, Tsai, Zen Hsiang, Ao, Chen Yu, Thuang, H. C., Liou, Jian Shin, Yang, Chuen Huei, Lin, Ling ChiehVolume:
6155
Year:
2006
Language:
english
DOI:
10.1117/12.657900
File:
PDF, 386 KB
english, 2006