SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Multi-layer resist system for 45-nm-node and beyond: part II
Fujimura, Yukihiro, Martin, Patrick M., Naber, Robert J., Morimoto, Jumpei, Manoshiro, Asuka, Shimizu, Mochihiro, Takamizawa, Hideyoshi, Hashimoto, Masahiro, Shiratori, Hiroshi, Horii, Katsuhiko, YokoVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.692896
File:
PDF, 835 KB
english, 2006