![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects
Shiu, Lin-Hung, Flagello, Donis G., Liang, Fu-Jye, Chang, Hsing, Chen, Chun-Kuang, Chen, Li-Jui, Gau, Tsai-Sheng, Lin, Burn J.Volume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.712527
File:
PDF, 861 KB
english, 2007