SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Chemically amplified fullerene resists for e-beam lithography
Henderson, Clifford L., Manyam, J., Gibbons, F. P., Diegoli, S., Manickam, M., Preece, J. A., Palmer, R. E., Robinson, A. P. G.Volume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.772645
File:
PDF, 1.08 MB
english, 2008