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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Application of super-diffraction-lithography (SDL) for advanced logic
Nakao, Shuji, Horiuchi, Toshiyuki, Maejima, Shinroku, Mitarai, Yuko, Hagiwara, Takuya, Ogawa, Sachiko, Hanawa, Tetsuro, Suko, KazuyukiVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793123
File:
PDF, 1.40 MB
english, 2008