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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Printability verification for double-patterning technology
Luk-Pat, Gerard, Kawahira, Hiroichi, Zurbrick, Larry S., Panaite, Petrisor, Lucas, Kevin, Cork, Christopher, Wiaux, Vincent, Verhaegen, Staf, Maenhoudt, MireilleVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801545
File:
PDF, 1.27 MB
english, 2008