SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Hybrid resist systems based on α-substituted acrylate copolymers
Ito, Hiroshi, Henderson, Clifford L., Sundberg, Linda K., Bozano, Luisa, Lofano, Elizabeth M., Yamanaka, Kazuhiro, Terui, Yoshiharu, Fujiwara, MasakiVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.813352
File:
PDF, 1.33 MB
english, 2009