![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Line edge roughness transfer during plasma etching: modeling approaches and comparison with experimental results
Constantoudis, Vassilios, Henderson, Clifford L., Kokkoris, George, Xydi, Panayiota, Gogolides, Evangelos, Pargon, Erwine, Martin, MickaelVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.823608
File:
PDF, 489 KB
english, 2009