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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - European MEDEA+ CRYSTAL project: DFM photomasks inputs for EDA workflow task force
Beisser, Eric, Hosono, Kunihiro, Tissier, Michel, Au, David, Bonniol, Stéphane, Garcia, Patrick, Morey-Chaisemartin, Philippe, Sadran, Dominique, Servin, Isabelle, Tabusse, MichelVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824273
File:
PDF, 164 KB
english, 2009